All-MOCVD-grown gallium nitride diodes with ultra-low resistance tunnel junctions

نویسندگان

چکیده

Abstract We carefully investigate three important effects including postgrowth activation annealing, delta ( δ ) dose and magnesium (Mg) buildup delay as well experimentally demonstrate their influence on the electrical properties of GaN homojunction p–n diodes with a tunnel junction (TJ). The were monolithically grown by metalorganic chemical vapor deposition (MOCVD) in single growth step. By optimizing annealing parameters for Mg activation, -dose both donors acceptors at TJ interfaces, p + -GaN layer thickness, significant improvement tunneling is achieved. For TJs embedded within continuously-grown, all-MOCVD diode structures, ultra-low voltage penalties 158 mV 490 are obtained current densities 20 A cm −2 100 , respectively. engineered show record-low differential resistivity 1.6 × 10 −4 Ω 2 5 kA .

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ژورنال

عنوان ژورنال: Journal of Physics D

سال: 2021

ISSN: ['1361-6463', '0022-3727']

DOI: https://doi.org/10.1088/1361-6463/abdb0f